氧化钽薄膜的制备及光学性能研究.zip
氧化钽薄膜的制备及光学性能研究,包括开题报告，任务书，ppt，翻译原文和译文摘要iabstractii1 引言11.1光学薄膜的应用11.1.1光学薄膜在显示器技术中的应用11.1.2 光学薄膜在光通讯中的应用11.1.3 光学薄膜在硅太阳能电池中的应用21.2氧化钽薄膜研究现状32实验52.1氧化钽薄膜制备52.1.1磁控溅射原理52.1.2氧化钽...
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内容介绍
原文档由会员 牛奶咖啡 发布
包括开题报告，任务书，ppt，翻译原文和译文
摘要 I
Abstract II
1 引言 1
1.1光学薄膜的应用 1
1.1.1光学薄膜在显示器技术中的应用 1
1.1.2 光学薄膜在光通讯中的应用 1
1.1.3 光学薄膜在硅太阳能电池中的应用 2
1.2氧化钽薄膜研究现状 3
2实验 5
2.1氧化钽薄膜制备 5
2.1.1磁控溅射原理 5
2.1.2氧化钽薄膜制备 7
2.2氧化钽薄膜光学性能测试 8
2.2.1 椭圆偏振测量 8
2.2.2分光光度计检测薄膜透过率 9
3实验结果与讨论 10
3.1氧化薄膜的沉积速率与工艺条件的关系 10
3.2氧化钽薄膜光学性能的研究 11
3.2.1 氧化钽薄膜折射率和光学带隙 11
3.2.2溅射功率对薄膜透光率的影响 14
4、结论 16
参考文献 17
致谢 19
氧化钽薄膜的制备及光学性能研究
摘要
如今光学薄膜已经被广泛研究并应用于光纤通信、航空航天以及军事等诸多领域，如光学集成电路与光学微机械电子系统、表面光学处理模块与器件等作为动态随机存储(DRAM)、金属氧化硅晶体管、减反膜、高温阻抗、气敏传感器、以及电容器的关键材料等。Ta2O5薄膜具有很多优良的光学性能，如在可见光范围有较大折射率(n=2.2 at 633 nm)、较小的消光系数，是一种性能优异的光学薄膜，具有很好的应用前景。
本实验以氧化钽为靶材，以氧和氩的混合气体为溅射气体，采用磁控溅射法在三个不同的溅射功率下制备了三组氧化钽薄膜样品。重点研究了不同的溅射功率对薄膜的沉积速率、折射率及透光率的影响。
采用光谱椭偏仪研究了溅射功率对氧化钽薄膜沉积速率、折射率和光学带隙的影响，结果表明随着溅射功率的增大，薄膜的沉积速率提高，薄膜的折射率增大，但对光学带隙无明显的影响。采用紫外-可见分光光度计对氧化钽薄膜的透过率进行了分析，结果显示氧化钽薄膜对300~2000 nm波段的光波的透光率接近90%，且随着溅射功率的提高，薄膜的透光率降低。
关键词：五氧化二钽薄膜；光学性能；磁控溅射；沉积速率；折射率；透光率
The study of tantalum oxide thin films and its optical properties
Abstract
Optical film has been extensively studied and applied to the optical fiber communication, aerospace and military, and many other fields, such as optical integrated circuits and optical micro-mechanical and electronic systems, surface optical processing module and device, as a key material used in dynamic randomaccess memory (DRAM), metal oxide silicon transistor, anti-reflection film, high temperature resistance, gas sensors, and capacitors. Ta2O5 film having excellent optical properties, such as in the visible range and a larger refractive index (n = 2.2 at 633 nm), the extinction coefficient is small, so it is a high performance of an optical film and have a good application prospect.
Tantalum oxide films were prepared under three different sputtering power by magnetron sputtering on glass substrates from tantalum oxide target in a mixed gas of oxygen and argon. Influence of the sputtering power on deposition rate, refractive index and light transmittance of the films was investigated.
Thickness, refractive index and optical bandgap of the tantalum oxide films with different sputtering power were analyzed by spectroscopic ellipsometry deposition. The results show that with increasing sputtering power, the deposition rate increases, and the refractive index of the film increases, but the optical bandgap has no significant change. The transmittance of tantalum oxide thin film was determined by ultraviolet-visible spectrophotometer. The results show that the transmittance of tantalum oxide film in the wavelength of 300 ~ 2000 nm is close to 90%, and with the sputtering power increasing, the transmittance of the thin film decreases due to an decrease of the film density.
Keywords：tantalum oxide film; optical properties; magnetron sputtering; deposition rate; refractive index; transmittance
摘要 I
Abstract II
1 引言 1
1.1光学薄膜的应用 1
1.1.1光学薄膜在显示器技术中的应用 1
1.1.2 光学薄膜在光通讯中的应用 1
1.1.3 光学薄膜在硅太阳能电池中的应用 2
1.2氧化钽薄膜研究现状 3
2实验 5
2.1氧化钽薄膜制备 5
2.1.1磁控溅射原理 5
2.1.2氧化钽薄膜制备 7
2.2氧化钽薄膜光学性能测试 8
2.2.1 椭圆偏振测量 8
2.2.2分光光度计检测薄膜透过率 9
3实验结果与讨论 10
3.1氧化薄膜的沉积速率与工艺条件的关系 10
3.2氧化钽薄膜光学性能的研究 11
3.2.1 氧化钽薄膜折射率和光学带隙 11
3.2.2溅射功率对薄膜透光率的影响 14
4、结论 16
参考文献 17
致谢 19
氧化钽薄膜的制备及光学性能研究
摘要
如今光学薄膜已经被广泛研究并应用于光纤通信、航空航天以及军事等诸多领域，如光学集成电路与光学微机械电子系统、表面光学处理模块与器件等作为动态随机存储(DRAM)、金属氧化硅晶体管、减反膜、高温阻抗、气敏传感器、以及电容器的关键材料等。Ta2O5薄膜具有很多优良的光学性能，如在可见光范围有较大折射率(n=2.2 at 633 nm)、较小的消光系数，是一种性能优异的光学薄膜，具有很好的应用前景。
本实验以氧化钽为靶材，以氧和氩的混合气体为溅射气体，采用磁控溅射法在三个不同的溅射功率下制备了三组氧化钽薄膜样品。重点研究了不同的溅射功率对薄膜的沉积速率、折射率及透光率的影响。
采用光谱椭偏仪研究了溅射功率对氧化钽薄膜沉积速率、折射率和光学带隙的影响，结果表明随着溅射功率的增大，薄膜的沉积速率提高，薄膜的折射率增大，但对光学带隙无明显的影响。采用紫外-可见分光光度计对氧化钽薄膜的透过率进行了分析，结果显示氧化钽薄膜对300~2000 nm波段的光波的透光率接近90%，且随着溅射功率的提高，薄膜的透光率降低。
关键词：五氧化二钽薄膜；光学性能；磁控溅射；沉积速率；折射率；透光率
The study of tantalum oxide thin films and its optical properties
Abstract
Optical film has been extensively studied and applied to the optical fiber communication, aerospace and military, and many other fields, such as optical integrated circuits and optical micro-mechanical and electronic systems, surface optical processing module and device, as a key material used in dynamic randomaccess memory (DRAM), metal oxide silicon transistor, anti-reflection film, high temperature resistance, gas sensors, and capacitors. Ta2O5 film having excellent optical properties, such as in the visible range and a larger refractive index (n = 2.2 at 633 nm), the extinction coefficient is small, so it is a high performance of an optical film and have a good application prospect.
Tantalum oxide films were prepared under three different sputtering power by magnetron sputtering on glass substrates from tantalum oxide target in a mixed gas of oxygen and argon. Influence of the sputtering power on deposition rate, refractive index and light transmittance of the films was investigated.
Thickness, refractive index and optical bandgap of the tantalum oxide films with different sputtering power were analyzed by spectroscopic ellipsometry deposition. The results show that with increasing sputtering power, the deposition rate increases, and the refractive index of the film increases, but the optical bandgap has no significant change. The transmittance of tantalum oxide thin film was determined by ultraviolet-visible spectrophotometer. The results show that the transmittance of tantalum oxide film in the wavelength of 300 ~ 2000 nm is close to 90%, and with the sputtering power increasing, the transmittance of the thin film decreases due to an decrease of the film density.
Keywords：tantalum oxide film; optical properties; magnetron sputtering; deposition rate; refractive index; transmittance
