单晶炉热场温度监控系统设计.doc
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单晶炉热场温度监控系统设计,design of temperature control system for thermal field of single crystal furnace23800字 48页摘要单晶炉是以直拉法从熔化的多晶硅熔液中生长硅单晶的电子专用设备。而等径控制是单晶炉自动控制的核心。单晶直径在生长...
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单晶炉热场温度监控系统设计
Design of temperature control system for thermal field of single crystal furnace
23800字 48页
摘 要
单晶炉是以直拉法从熔化的多晶硅熔液中生长硅单晶的电子专用设备。而等径控制是单晶炉自动控制的核心。单晶直径在生长过程中可受到温度、提拉速度与转速、坩埚跟踪速度与转速、保护气体的流速与温度等因素的影响。在忽略一些干扰因素影响情况下，单晶等径生长主要受温度和拉速影响。因此，炉内热场和生长速度的精确控制是单晶等径控制的重点，由于这种控制系统是一个缓慢时变，并且具干扰严重的非最小相位系统。
介绍了论文的研究背景以及国内外在直拉单晶炉研究现状及发展,并对热场及其控制以及CZ150直拉单晶炉进行了介绍,并由此引出了论文的研究内容和方法。主要研究晶体的热动力、热传输,在此基础上对热场建模。叙述了直拉单晶炉热场模糊变系数PID温度控制,首先对直拉单晶炉热场的特性进行测试研究,然后用模糊变系数PID控制算法进行控制,用经验知识对模糊变系数PID算法中的参数进行修正,达到理想的控制效果。基于PLC的模块化直拉单晶炉热场温度控制系统的硬件实现,首先提出了直拉单晶炉热场对控制系统的硬件要求,然后对本系统的硬件设计进行了详细说明。基于PLC的模块化直拉单晶炉热场温度控制系统的软件实现,首先对软件系统的整体框架进行了介绍,然后对软件系统的各个程序模块逐个分析。
关键词:模块化,单晶炉,PLC,热场温度,控制策略,模糊变系数PID。
ABSTRACT
Single crystal furnace is a special electronic equipment growth of single crystal silicon polysilicon from the molten in the Czochralski method. While the diameter control is the core of the automatic control of the single crystal furnace. The diameter of a single crystal can affect the velocity and temperature and other factors are influenced by temperature, pulling speed and speed, tracking speed and speed, the crucible of the shielding gas during growth. Ignoring some interference factors case, single crystal diameter growth was mainly controlled by temperature and the effect of casting speed. Therefore, precise control of furnace thermal field and growth rate of crystal diameter control is key, because of this control system is a slowly time-varying, non minimum phase system with disturbance and severe.
These is divided into seven chapters :
The first chapter introduces the research background and research abroad in Silicon crystal furnace status and development , and its control and thermal field CZ150 Silicon crystal furnace were introduced, and thus leads to the contents of the thesis papers and methods.The second chapter of the work is mainly to study the thermal power crystals , heat transfer , on the basis of the modeling of the thermal field .The third chapter details the Silicon crystal furnace hot zone fuzzy PID temperature control with variable coefficients , first Silicon crystal furnace for testing the characteristics of thermal field research , and then use the fuzzy variable coefficient PID control algorithm to control the use of empirical knowledge PID fuzzy variable coefficient correction algorithm parameters to achieve the desired control effect.The fourth chapter details the modular PLC based hardware Silicon crystal furnace hot zone temperature control system implementation, first proposed the Silicon crystal furnace thermal field of the control system hardware requirements , then the system's hardware design detail.The fifth chapter details the PLC based modular Silicon crystal furnace hot zone temperature control system software , the first software system for the overall framework were introduced, and then individually analyzed for each program module software system.Chapter VI summarizes the contents of this thesis , and the subject of further research is needed to improve the focus for a certain amount of discussion, analysis and outlook .
Keywords : modular , single crystal furnace , PLC, thermal field temperature control strategy , fuzzy variable coefficient PID.
目 录
摘 要 1
第一章 绪论 6
1.1课题提出背景及单晶炉简介 6
1.1.1 课题提出背景 6
1.1.2硅单晶直拉法制备简介 6
1.1.3直拉单晶炉结构简介 7
1.1.4直拉单晶炉的发展概述 8
1.2国内外研究现状 9
1.3研究内容 11
第二章 直拉单晶炉控制系统 12
2.1直拉单晶炉控制系统 12
2.2直拉单晶炉热场及其影响因素 13
2.2.1直拉单晶炉热系统和热场 13
2.2.2影响热场温度梯度的因素 14
2.3直拉单晶炉热场控制系统总体 15
2.3.1直拉单晶炉热场控制系统 15
2.3.2直拉单晶炉热场温度控制方式 16
2.3.3热场温度控制算法 17
2.4本章小结 18
第三章 直拉单晶炉热场模糊变系数PID温度控制算法研究 19
3.1直拉单晶炉热场模糊变系数PID温度控制 19
3.1.1模糊控制原理 19
3.1.2模糊控制器各部分实现方法 20
3.1.3模糊控制器的设计 21
3.2模糊变系数PID原理 23
3.2.1模糊变系数PID参数整定思想 25
3.3本章小结 27
第四章 基于PLC直拉单晶炉热场控制系统硬件实现 28
4.1热场控制系统主要功能及硬件要求 28
4.1.1选择和采购温度传感器 28
4.1.2热场控制系统主要功能 29
4.1.3热场控制系统的硬件要求 29
4.2热场控制系统的硬件设计 31
4.2.1热场控制系统设计原理 31
4.2.2加热器接口 31
4.2.3直拉单晶炉热场控制系统功能模块 32
4.3本章小结 37
第五章 基于PLC直拉单晶炉热场温度控制..
Design of temperature control system for thermal field of single crystal furnace
23800字 48页
摘 要
单晶炉是以直拉法从熔化的多晶硅熔液中生长硅单晶的电子专用设备。而等径控制是单晶炉自动控制的核心。单晶直径在生长过程中可受到温度、提拉速度与转速、坩埚跟踪速度与转速、保护气体的流速与温度等因素的影响。在忽略一些干扰因素影响情况下，单晶等径生长主要受温度和拉速影响。因此，炉内热场和生长速度的精确控制是单晶等径控制的重点，由于这种控制系统是一个缓慢时变，并且具干扰严重的非最小相位系统。
介绍了论文的研究背景以及国内外在直拉单晶炉研究现状及发展,并对热场及其控制以及CZ150直拉单晶炉进行了介绍,并由此引出了论文的研究内容和方法。主要研究晶体的热动力、热传输,在此基础上对热场建模。叙述了直拉单晶炉热场模糊变系数PID温度控制,首先对直拉单晶炉热场的特性进行测试研究,然后用模糊变系数PID控制算法进行控制,用经验知识对模糊变系数PID算法中的参数进行修正,达到理想的控制效果。基于PLC的模块化直拉单晶炉热场温度控制系统的硬件实现,首先提出了直拉单晶炉热场对控制系统的硬件要求,然后对本系统的硬件设计进行了详细说明。基于PLC的模块化直拉单晶炉热场温度控制系统的软件实现,首先对软件系统的整体框架进行了介绍,然后对软件系统的各个程序模块逐个分析。
关键词:模块化,单晶炉,PLC,热场温度,控制策略,模糊变系数PID。
ABSTRACT
Single crystal furnace is a special electronic equipment growth of single crystal silicon polysilicon from the molten in the Czochralski method. While the diameter control is the core of the automatic control of the single crystal furnace. The diameter of a single crystal can affect the velocity and temperature and other factors are influenced by temperature, pulling speed and speed, tracking speed and speed, the crucible of the shielding gas during growth. Ignoring some interference factors case, single crystal diameter growth was mainly controlled by temperature and the effect of casting speed. Therefore, precise control of furnace thermal field and growth rate of crystal diameter control is key, because of this control system is a slowly time-varying, non minimum phase system with disturbance and severe.
These is divided into seven chapters :
The first chapter introduces the research background and research abroad in Silicon crystal furnace status and development , and its control and thermal field CZ150 Silicon crystal furnace were introduced, and thus leads to the contents of the thesis papers and methods.The second chapter of the work is mainly to study the thermal power crystals , heat transfer , on the basis of the modeling of the thermal field .The third chapter details the Silicon crystal furnace hot zone fuzzy PID temperature control with variable coefficients , first Silicon crystal furnace for testing the characteristics of thermal field research , and then use the fuzzy variable coefficient PID control algorithm to control the use of empirical knowledge PID fuzzy variable coefficient correction algorithm parameters to achieve the desired control effect.The fourth chapter details the modular PLC based hardware Silicon crystal furnace hot zone temperature control system implementation, first proposed the Silicon crystal furnace thermal field of the control system hardware requirements , then the system's hardware design detail.The fifth chapter details the PLC based modular Silicon crystal furnace hot zone temperature control system software , the first software system for the overall framework were introduced, and then individually analyzed for each program module software system.Chapter VI summarizes the contents of this thesis , and the subject of further research is needed to improve the focus for a certain amount of discussion, analysis and outlook .
Keywords : modular , single crystal furnace , PLC, thermal field temperature control strategy , fuzzy variable coefficient PID.
目 录
摘 要 1
第一章 绪论 6
1.1课题提出背景及单晶炉简介 6
1.1.1 课题提出背景 6
1.1.2硅单晶直拉法制备简介 6
1.1.3直拉单晶炉结构简介 7
1.1.4直拉单晶炉的发展概述 8
1.2国内外研究现状 9
1.3研究内容 11
第二章 直拉单晶炉控制系统 12
2.1直拉单晶炉控制系统 12
2.2直拉单晶炉热场及其影响因素 13
2.2.1直拉单晶炉热系统和热场 13
2.2.2影响热场温度梯度的因素 14
2.3直拉单晶炉热场控制系统总体 15
2.3.1直拉单晶炉热场控制系统 15
2.3.2直拉单晶炉热场温度控制方式 16
2.3.3热场温度控制算法 17
2.4本章小结 18
第三章 直拉单晶炉热场模糊变系数PID温度控制算法研究 19
3.1直拉单晶炉热场模糊变系数PID温度控制 19
3.1.1模糊控制原理 19
3.1.2模糊控制器各部分实现方法 20
3.1.3模糊控制器的设计 21
3.2模糊变系数PID原理 23
3.2.1模糊变系数PID参数整定思想 25
3.3本章小结 27
第四章 基于PLC直拉单晶炉热场控制系统硬件实现 28
4.1热场控制系统主要功能及硬件要求 28
4.1.1选择和采购温度传感器 28
4.1.2热场控制系统主要功能 29
4.1.3热场控制系统的硬件要求 29
4.2热场控制系统的硬件设计 31
4.2.1热场控制系统设计原理 31
4.2.2加热器接口 31
4.2.3直拉单晶炉热场控制系统功能模块 32
4.3本章小结 37
第五章 基于PLC直拉单晶炉热场温度控制..
